High-productivity Continuous Atmospheric Pressure CVD (APCVD) System (AMAX1200)
Mass production / NSG(SiO2)/PSG/BPSG deposition High-productivity / Continuous atmospheric pressure CVD (APCVD) system (for 12-inch wafers)
The AMAX series is a continuous atmospheric pressure CVD system (APCVD system) for silicon oxide (SiO2) deposition, such as an interlayer insulator deposition, passivation deposition (protective deposition), and back seal (for epitaxial wafers). 【Features】 ・High productivity of up to 56 wafers/h (wafer size: up to 12 inches) ・No vacuum or plasma is required (thermal CVD) ・SiC trays are used to prevent heavy metal contamination. ・Simple maintenance. ・Low CoO (low running cost) 【Applications】 ・Back seal for epitaxial wafers (NSG) ・Passivation deposition (protective deposition, insulating deposition) (NSG) *For more details, please contact us or download the catalog to view.
- Company：M.WATANABE & CO.,LTD.
- Price：Other
